|
半導體 -
半導體制造商壓力儀表
Semiconductor -
Pressure instruments for semiconductor manufacturers
全球半導體行業近年來的顯著增長預計將持續到 2021 年及以后。主要促成因素包括微電子在電氣和電子設備中的應用增加、人工智能、IoT（物聯網）以及工業 4.0 計劃的擴展。隨著這些變化的發生，半導體供應商面臨著改善供應以滿足需求的挑戰——即增加晶體管密度、提高可靠性，當然還有降低生產和采購成本。
Ashcroft 已準備好并愿意幫助半導體制造商應對并克服這一挑戰。憑借豐富的行業特定經驗，我們擁有知識和技能來幫助開發、設計、制造和測試高質量半導體生產所需的儀器和設備。
我們提供各種壓力測量產品，包括采用我們專有的超穩定 CVD 傳感技術的變送器，適用于半導體制造應用。我們產品的性能與全球安全認證以及在最關鍵的半導體應用中的性能相結合。
在半導體工具中，氣體面板控制氣體流入處理室。壓力傳感器安裝在每個氣體棒上的氣體面板內部，以監控壓力調節器的壓力輸出。這個位置使他們能夠發送信號，以更高的精度、準確度和速度調整系統操作，從而實現更好的整體系統功能。
氣體面板
在半導體工具中，氣體面板控制氣體流入處理室。壓力傳感器安裝在每個氣體棒上的氣體面板內部，以監控壓力調節器的壓力輸出。這個位置使他們能夠發送信號，以更高的精度、準確度和速度調整系統操作，從而實現更好的整體系統功能。
危險氣體壓力測量
半導體應用中使用的一些氣體是有毒的、易燃的，并且對處理它們的人來說是危險的。 這些危險要求許多產品獲得 ATEX 和 IECEx 危險場所認證。 日本的 Ashcroft 和 Nagano Keiki Co. Ltd.（我們的母公司）每年生產超過 100,000 個壓力變送器和壓力表，這些壓力變送器和壓力表專為在半導體行業應用中安全使用而設計和制造。
氫氣壓力測量
氫氣是超高壓氣體輸送中最常用的載氣之一。安全處理氫氣需要采取保護措施來降低火災或爆炸的風險。優選的方法包括本質安全和無火花認證。要記住的一個關鍵因素是氫脆的影響。壓力變送器和壓力表的穩定性和可重復性依賴于它們的測量機制（直接與冶金學及其抗脆性相關）。Ashcroft 高純度變送器和儀表采用高純度奧氏體 316L 不銹鋼，已被證明可以減輕氫脆的影響。
潔凈室壓力測量
防止污染物滲入潔凈室和其他潔凈空間所需的壓力量是非常具體的。壓力太小會導致不需要的顆粒進入該區域，而壓力太大會導致空氣過度流動并浪費能源。集成到空氣處理設備中的壓力傳感器和儀表必須非常靈敏、準確和可靠。
濕法加工和蝕刻
半導體制造過程涉及將空白硅晶片高度復雜地轉變為分立的微電子器件。開發出電路設計和圖案，然后將其蝕刻到晶片上。然后可以將晶片分解成單獨的電路以用于電子設備。半導體制造不斷面臨著增加可裝入每個晶片的電路數量和密度的挑戰。濕法蝕刻使用腐蝕性化學品來進行微細加工。
干蝕刻和等離子灰化
干蝕刻工藝，包括反應離子蝕刻 (RIE)，通常用于在硅晶片圖案上形成接觸孔。它使用活性氣體，如碳氟化合物、氧氣、氯氣和三氯化硼。灰化是一種類似于干法蝕刻的過程，用于去除晶片上的光刻膠（光敏涂層）。等離子灰化使用氧氣或氟氣，控制這些需要精確壓力測量的氣體的流速很重要。
化學氣相沉積
半導體工業中的化學氣相沉積 (CVD) 工藝涉及使用載氣（例如氮氣或氧氣）來稀釋有毒氣體（例如磷化氫或一氧化二氮）。半導體氣體可能易燃、有毒和易爆，因此必須仔細選擇具有適當批準用于本質安全或非易燃位置的壓力傳感器，以解決關鍵的安全問題。
超純水/去離子水設施
對于所有污染物類型，超純水均經過最高純度處理，而去離子水則去除了所有有機顆粒和溶解氣體。晶圓清洗等半導體工藝需要超純水和去離子水，以防止異物在應用中造成污染，從而對暴露的晶圓表面造成缺陷和損壞。
壓力測量在半導體制造中的重要性
如今，半導體制造業務依賴于精確準確地輸送超高純度 (UHP) 氣體，這要求純度水平超過 99.9995% 并嚴格控制雜散顆粒和水分。鑒于 UHP 供氣系統的重要性，用于其分配的測量和控制技術必須提供高精度、高精度的性能，同時保持系統內部的絕對清潔。建筑材料在與超高壓氣體接觸時必須保持惰性，最大限度地減少滯留（死）體積的風險，并防止顆粒脫落和滯留。
雖然對現代半導體的制造至關重要，但超高壓氣體的毒性和易燃性對處理它們的人的健康和福祉構成了重大風險。出于這個原因，半導體操作中使用的一些設備需要符合泄漏完整性和危險位置規范和標準（例如，ATEX 和 IECEx）以確保用戶安全。
Ashcroft 高純壓力測量解決方案
用于半導體制造的 Ashcroft 壓力儀表
ZT 高純度變送器和 HPX 高純度壓力表
我們的 ZT/ZX 壓力變送器和 HPX 壓力表專為半導體應用而設計。這些產品采用電拋光 316L 不銹鋼接液部件和 VCR 兼容、模塊化和焊接管接頭，死體積最小。它們具有緊湊的設計，可在氣箱和氣體輸送系統內容納更高密度的安裝配置。ZX11 包括 ATEC 和 IECEx 危險場所認證。
ZL91 壓力傳感器、ZL92 壓力傳感器和 HPT - 63 mm 壓力表
Ashcroft ZL91 壓力傳感器由含氟聚合物 (PTFE/PFA) 潤濕部件構成，可最大限度地減少金屬離子洗脫。其緊湊的設計有助于減少污染并保持過程流體的純度。該傳感器非常適用于超純水/去離子水設施和設備、半導體清洗設備和濕站應用。
Ashcroft ZL92 壓力傳感器設計用于需要 PTFE/PFA 接液部件的半導體工藝，以提高在腐蝕性氣體和流體（包括氫氟酸或其他腐蝕性酸）中使用的化學兼容性。二級隔離膜片和通風口設計將陶瓷傳感元件與腐蝕性氣體和液體隔離，從而延長了換能器的使用壽命。該換能器適用于半導體、濕法蝕刻和化學品供應系統的清潔設備。
Ashcroft 63 mm HPT防腐壓力表為半導體和電子制造行業的化學品輸送系統提供卓越的性能和可靠性。它經過氮氣泄漏測試以確保卓越的完整性，而緊湊的設計非常適合有限空間的安裝。該儀表由含氟聚合物接液部件制成，使其與使用腐蝕性或非污染流體的工藝兼容。在非污染工藝中，接液部件可防止金屬離子洗脫——非常適合超純水或去離子水工藝。
Ashcroft 硅玻璃傳感器技術
用于潔凈室和潔凈空間的低差壓變送器和傳感器
我們的許多差壓傳感器——包括 DXLdp、CXLdp、AXLdp 和 GC30——都集成了Si-Glas ?技術，這有助于它們滿足超低差壓應用的高度關鍵的監測和控制需求。壓力范圍低至 0.05 in H2O (12.5 Pa)，可在極低的壓力下進行最嚴格的控制。
我們的 1130 系列壓力表設計用于集成到手套箱、晶片處理設備和壓差范圍低至 0.6 in H2O (150 Pa) 的墻板中。
- HPX高純壓力表 50mm / 63mm high purity pressure gauge
- HPX微型高純壓力表 -28mm HPX Miniatre high purity pressure gauge 28 mm
- ZT11 高純壓力變送器 High purity pressure transmitter
- ZX11 高純壓力變送器 High purity pressure transmitter
- ZT16 高純壓力變送器 High purity pressure transmitter
- HPT - 63毫米壓力表 63mm pressure gauge
- ZL91 含氟聚合物壓力傳感器 FLuoropolymer pressure transducer
- ZL92 含氟聚合物壓力傳感器 FLuoropolymer pressure transducer
***********************************************************
Semiconductor
Pressure instruments for semiconductor manufacturers
The global semiconductor industry’s significant growth in recent years is expected to continue through 2021 and beyond. Key contributing factors include the increase in the incorporation of microelectronics in electrical and electronic devices, artificial intelligence, IoT (Internet of Things), and the expansion of Industry 4.0 initiatives. As these changes occur, semiconductor suppliers face the challenge of improving supply to meet demand—i.e., increasing transistor density, improving reliability, and, of course, reducing production and purchasing costs.
Ashcroft is ready and willing to help semiconductor manufacturers take on and overcome this challenge. Equipped with extensive industry-specific experience, we have the knowledge and skills to help develop, engineer, manufacture, and test the instruments and equipment necessary for high-quality semiconductor production.
We offer a variety of pressure measurement products—including transmitters with our proprietary ultra-stable CVD sensing technology—suitable for use in semiconductor manufacturing applications. The performance of our products are coupled with global safety approvals and a legacy of performance in the most critical semiconductor applications.
Gas Panels
In semiconductor tools, the gas panel controls the flow of gas into the process chamber. Pressure transducers are installed inside of the gas panel on each of the gas sticks to monitor the pressure output of the pressure regulator. This position enables them to send signals that adjust system operation with greater precision, accuracy, and speed, resulting in better overall system function.
Hazardous Gas Pressure Measurement
Some of the gases used in semiconductor applications are toxic, flammable, and otherwise dangerous to those handling them. These dangers necessitate ATEX and IECEx hazardous location approval for many products. Ashcroft and Nagano Keiki Co. Ltd. of Japan (our parent company) annually produce over 100,000 pressure transmitters and gauges designed and engineered for safe use in semiconductor industry applications.
Hydrogen Pressure Measurement
Hydrogen is one of the most common carrier gases used in UHP gas delivery. Safely handling hydrogen requires the implementation of protective measures that mitigate the risk of fire or explosion. Preferred methods include Intrinsic Safety and Non-Sparking Approvals. One critical factor to keep in mind is the effect of hydrogen embrittlement. The stability and repeatability of pressure transmitters and gauges rely on their measuring mechanisms (directly tied to the metallurgy and their resistance to embrittlement). Ashcroft high-purity transmitters and gauges utilize high-purity austenitic 316L stainless steel, which has been shown to mitigate the effects of hydrogen embrittlement.
Cleanroom Pressure Measurement
The amount of pressure needed to prevent contaminants from infiltrating cleanrooms and other clean spaces is highly specific. Too little pressure results in unwanted particles entering the area, while too much pressure causes excessive air movement and wasted energy. Pressure transducers and gauges integrated into the air handling equipment must be extremely sensitive, accurate, and reliable.
Wet Processing and Etching
The semiconductor manufacturing process involves the highly complex transformation of a blank silicon wafer into discrete microelectronic devices. A circuit design and pattern are developed, which are then etched onto the wafer. The wafers can then be broken into individual circuits to be used in electronic devices. Semiconductor manufacturing is continually challenged to increase the amount and density of the circuitry that can fit into each wafer. Wet etching uses aggressive chemicals to perform microfabrication.
Dry Etching and Plasma Ashing
The process of dry etching, including Reactive Ion Etching (RIE), is commonly used to form contact holes on silicon wafer patterns. It uses reactive gases such as fluorocarbons, oxygen, chlorine and boron trichloride. Ashing is a similar process as dry etching to remove the photoresist (light-sensitive coating) on the wafer. Plasma ashing uses oxygen or fluorine gases, and it is important to control the flow rate of these gases that require accurate pressure measurement.
Chemical Vapor Deposition
The process of Chemical Vapor Deposition (CVD) in the semiconductor industry involves using a carrier gas, such as Nitrogen or Oxygen, to dilute a toxic gas, such as Phosphine or Nitrous Oxide. Semiconductor gases can be flammable, toxic and explosive, so careful selection of a pressure transducer with appropriate approvals for intrinsic safety or non-incendive locations must be made to address critical safety concerns.
Ultrapure/Deionized Water Facilities
Ultrapure water is treated to the highest levels of purity for all contaminant types, and deionized water has all organic particles and dissolved gases removed. Semiconductor processes such as wafer cleaning require ultrapure and deionized water to prevent contamination in the application from foreign particles creating defects and damage to the exposed wafer surfaces.
Importance of Pressure Measurement in Semiconductor Manufacturing
Today, semiconductor manufacturing operations rely on the precise and accurate delivery of ultra-high purity (UHP) gases, which require purity levels to exceed 99.9995% and stringent control over stray particles and moisture. Given the importance of UHP gas supply systems, the measurement and control technologies utilized for their distribution must offer high-precision, high-accuracy performance while maintaining absolute cleanliness inside the system. Construction materials must remain inert when in contact with the UHP gases, minimize the risk of trapped (dead) volume, and prevent particle shedding and entrapment.
While essential to the manufacture of modern semiconductors, the toxicity and flammability of UHP gases pose significant risks to the health and well-being of those handling them. For this reason, some devices used in semiconductor operations are required to comply with leak integrity and hazardous location specifications and standards (e.g., ATEX and IECEx) to assure user safety.
Ashcroft Pressure Instruments for Semiconductor Manufacturing
Ashcroft High-Purity Pressure Measurement Solutions
ZT High-Purity Transmitters and HPX High Purity Pressure Gauges
Our ZT/ZX pressure transmitters and HPX pressure gauges are specially designed for use in semiconductor applications. These products feature electropolished 316L stainless steel wetted parts and VCR-compatible, modular and weld tube fittings with minimal dead volumes. They have compact designs that accommodate higher density mounting configurations inside gas boxes and gas delivery systems. The ZX11 includes ATEC and IECEx hazardous location approvals.
ZL91 Pressure Transducer, ZL92 Pressure Transducer and HPT - 63 mm Pressure Gauge
The Ashcroft ZL91 pressure transducer is constructed with fluoropolymer (PTFE/PFA) wetted parts that minimize metal ion elution. Its compact design helps to reduce contamination and maintain the purity of your process fluid. This transducer is well suited for ultrapure/de-ionized water facilities and equipment, cleaning equipment for semiconductor and wet station applications.
The Ashcroft ZL92 pressure transducer is designed for use in semiconductor processes that require PTFE/PFA wetted parts for improved chemical compatibility for use in corrosive gases and fluids, including Hydrofluoric acid or other aggressive acids. A secondary isolation diaphragm and vent design isolate the ceramic sensing element from corrosive gases and liquids, which extends the life span of the transducer. This transducer works well in cleaning equipment for semiconductor, wet etching and chemical supply systems.
The Ashcroft 63 mm HPT anti-corrosion pressure gauge offers exceptional performance and reliability for chemical delivery systems within the semiconductor and electronic fabrication industries. It’s nitrogen leak tested to ensure superior integrity, while the compact design is ideal for limited space installations. The gauge is made with fluoropolymer wetted parts making it compatible with processes that use corrosive or non-contaminating fluids. In non-contaminating processes, the wetted parts prevent metal ion elution – perfect for ultrapure or deionized water processes.
Ashcroft Si-Glas Sensor Technology
Low Differential Pressure Transmitters and Transducers for Clean Rooms and Clean Spaces
Many of our differential pressure transducers—including DXLdp, CXLdp, AXLdp, and GC30— are integrated with Si-Glas? technology, which helps them accommodate the highly critical monitoring and control needs of ultra-low differential pressure applications. Pressure ranges as low as 0.05 in H2O (12.5 Pa) allow for the tightest control at incredibly low pressures.
Our 1130 Series gauges are designed for incorporation into glove boxes, wafer handling equipment, and wall panels with differential pressure ranges as low as 0.6 in H2O (150 Pa).
Related Products
FAQs
Are there other scales and dial options for the HPX pressure gauges?
Are there other pressure connections available on the ZT/ZX pressure transmitters?
How are the Ashcroft high purity products packaged?
Related Content
Trust in the Ashcroft Experts
At Ashcroft, we are here to help you identify the right pressure instrument for your semiconductor needs. Whether you require gauges, transducers, or transmitters for a standard or cleanroom manufacturing environment, we’ll find the perfect product solution. Trust us with the success and safety of your project.
|
